000 00856pam a2200253 a 4500
999 _c60095
_d60095
001 1878038
003 FUTML
005 20170419113719.0
007 ta
008 190417s1984 nyua b 001 0 eng
010 _a 83011339
020 _a0070477094 :
_c$35.00
037 _aB-7523
040 _aDLC
_cFUTML
_dDLC
_bENG.
050 0 0 _aTK7871.99.M44
_bO53 1984
082 0 0 _a621.381/73042
_219
100 1 _aOng, DeWitt G.
_96845
245 1 0 _aModern MOS technology :
_bprocesses, devices, and design /
_cDeWitt G. Ong.
260 _aNew York :
_bMcGraw-Hill,
_cc1984.
300 _axii, 366 p. :
_bill. ;
_c24 cm.
504 _aIncludes bibliographical references and index.
590 _aB-7523/LAWAL/190417
650 0 _aMetal oxide semiconductors.
_96846
650 0 _aIntegrated circuits.
_96223
740 0 _aModern M.O.S. technology.
906 _a7
_bcbc
_corignew
_d1
_eocip
_f19
_gy-gencatlg
912 _aLAWAL
_bLAWAL
_cLAWAL
942 _2lcc
_cBKS
949 _aIBB LIBRARY GK
_cTK7871.99.O53 1984
_d.O53 1984
_g2342109156
_nnc 1